Sputtering Targets

As a senior manufacturer for varies nonferrous metals since 1956, XMaM has long and good experience for all pure metal and alloy target production. We also extend to all other new targets like oxide, ceramic, compounds etc and enjoy the same good reputation by its excellent performance. XMaM’s customized target products made of high purity raw material powder with super fine grain size, together with the distinguished homogeneous microstructure to achieve the longer life for target and desired characteristics of sputtering deposited thin film.

Early of 2000’s, introducing cold pressing and Plasma spraying process, XMaM successfully manufactured big rotatable targets(dia 350mmXlength 4000mm) used for large area coating, which obviously improved the target utilization and reduced the cost for customers.

Application Category:

Material Category:

Pure metals Alloys & cermets Oxides Bories Carbides Fluorides Nitrides Silicides

Manufacturing Mathods

Hot pressing Hot isostatic pressing (HIP) Powder metallurgical Plasma spraying Vacuum induction melting (VIM) Vacuum arc remelting (VAR) Cold pressing and sintering

Size and Shap

Planar & rectangular Cathode  Magnetrons Rotatable Cylindrical Circular Ring Multi-titles construction Tailor-made size and shape